Chemijos terminų aiškinamasis žodynas – 2-asis patais. ir papild. leid. – Vilnius: Mokslo ir enciklopedijų leidybos institutas. Kazys Daukšas, Jurgis Barkauskas, Vitas Daukšas. 2003.
tin plating — alavavimas statusas T sritis chemija apibrėžtis Elektrocheminis arba terminis dengimas alavu. atitikmenys: angl. tin deposition; tin plating; tinning rus. лужение; оловянирование … Chemijos terminų aiškinamasis žodynas
Tin dioxide — chembox new ImageFile = Rutile unit cell 3D balls.png ImageSize = 150px IUPACName = Tin(IV) oxide SystematicName = OtherNames = stannic oxide, tin(IV) oxide, stannic oxide, stannic anhydride, flowers of tin Section1 = Chembox Identifiers… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Indium tin oxide — (ITO, or tin doped indium oxide) is a solid solution of indium(III) oxide (In2O3) and tin(IV) oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight. It is transparent and colorless in thin layers. In bulk form, it is yellowish to grey. In the… … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Plasma Enhanced Chemical Vapour Deposition — Plasma Enhanced Chemical Vapour Deposition, PECVD or sometimes PCVD, is the process by which chemicals are deposited onto a substrate using a Radio Frequency (RF) Plasma to split the precursors into active ions.TheoryPrecursor chemical enter the… … Wikipedia
Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… … Wikipedia
Dartmoor tin-mining — The wheelpit at Huntingdon mine The Dartmoor tin mining industry is thought to have originated in pre Roman times,[1] and continued right through to the 20th century. From the 12th century onwards tin mining was regulated by a Stannary Parliament … Wikipedia
Cathodic arc deposition — or Arc PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique is can be used to deposit a… … Wikipedia
Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
